Ex Parte LINN et al - Page 9



          Appeal No. 2002-1981                                                         
          Application No. 09/316,580                                                   

          appellants have failed to present separate arguments in response             
          to the examiner's rejection of these claims.                                 
               2. Rejection of claims 10 and 13 under 35 U.S.C. § 112,                 
          second paragraph                                                             
                                                                                      
               Appellants do not appear to traverse this ground of                     
          rejection.  Rather, appellants note that they have previously                
          proposed amending claim 10 to reword line 11 to more clearly                 
          describe the bonding of the silicide layer to the handle die and             
          device wafer.  Appeal brief, page 6.  Appellants also note that              
          their proposed amendment to claim 13 (paper no. 6, received March            
          13, 2000) to insert an open bracket which was previously                     
          inadvertently admitted was not entered.  Id.                                 
               As appellants have failed to traverse the merits of the                 
          examiner's rejection, the rejection is affirmed.                             
               3. Rejection of claims 1-4 under 35 U.S.C. § 103 as                     
          unpatentable over Moslehi in view of See                                     
               The examiner found that Moslehi discloses the structure as              
          claimed with the exception that Moslehi does not show transistors            
          formed on the Si substrate.  Examiner's answer, page 10.  The                
          examiner relies on See solely for a teaching of bipolar and MOS              
          transistors formed on an Si substrate.  Id.                                  

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