Appeal No. 2002-1981 Application No. 09/316,580 Appellants' principle argument is that Moslehi fails to teach "the substantially continuous first dielectric layer overlying one side of said silicide layer" as required by claim 1. Appeal brief, page 10. In this regard, appellants point out that in the Moslehi structure, the layer overlying the oxide layer 22 contains both a silicide 40 and a metal 24 in a grid pattern. Id. The examiner, on the other hand, takes the position that while claim 1 recites a "substantially continuous silicide layer over the handle die,” the claim never requires a “continuous unpatterned silicide layer over the handle die." Examiner's answer, page 16. The examiner maintains that "[s]ince the polycrystalline silicon layer [38] is a continuous, grid- patterned layer, the TiSi2 (titanium silicide) layer [40] is also a continuous, grid-patterned layer formed on the handle die [20]." Id. In determining what is meant by words in a claim, we look to the specification. See In re Cruciferous Sprout Litigation v. Sunrise Farms, 301 F.2d 1343, 1348, 64 USPQ2d 1202, 1205 (Fed. Cir. 2002). We have reviewed the specification and are in agreement with appellants that the claim language "aPage: Previous 1 2 3 4 5 6 7 8 9 10 11 12 13 14 NextLast modified: November 3, 2007