Appeal No. 2004-0999
Application No. 09/997,086
Rejection of Claim 17
Dependent claim 17 is rejected under 35 U.S.C. § 103 as
being obvious over Ibnabdeljalil in view of Igarashi and further
in view of Mori. As set forth above, we find that Mori does not
teach the forming of at least one trench through an interconnect
layer. Consequently, the combination of Ibnabdeljalil, Igarashi,
and Mori does not teach or suggest "forming at least one wide
trench through said microelectronic device wafer interconnect
layer within said at least one dicing street" required in claim
17. Therefore, we will not sustain the rejection of claim 17.
Rejection of Claim 18
Dependent claim 18 is rejected under 35 U.S.C. § 103 as
being obvious over Ibnabdeljalil in view of Igarashi and Mori and
further in view of Wolf. We find that Wolf teaches plasma
etching to form trenches as Examiner pointed out on page 8 of the
answer. However, Wolf does not teach forming at least one trench
through an interconnect layer. Consequently, the combination of
Ibnabdeljalil, Igarashi, Mori, and Wolf does not teach or suggest
the step of "forming at least one wide trench through said
microelectronic device wafer interconnect layer within said at
16
Page: Previous 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 Next
Last modified: November 3, 2007