Appeal No. 2004-1123
Application No. 09/933,503
enclosure "at ten percent (10%) or less" so as to inhibit the
formation of contaminating layers on the semiconductor wafers
stored therein.
As for appellants' arguments (brief, page 6) regarding
Brooks and Roberson, we agree that Brooks does not specifically
teach controlling a relative humidity in the wafer storage
container therein "to not higher than 30%" as set forth in the
claims on appeal, however, we again observe that this patent at
column 1, lines 21-27, emphasizes that semiconductor wafers have
become so contaminant-sensitive that even "infinitesimal amounts"
of contaminants are a drawback to quality production and the
elimination of rejects. Closely following that disclosure,
Brooks specifically discusses the use of desiccant packages of
Silica Gel within semiconductor wafer storage containers to
absorb atmospheric contaminants such as moisture and oxygen
during packaging and storage. Thus, we consider that this patent
at least inferentially would have suggested to one of ordinary
skill in the art the reduction of contaminants such as moisture
and oxygen to below "infinitesimal amounts" in order to protect
the semiconductor wafers transported and stored in the containers
therein. Contrary to appellants' assertion, Roberson does teach
1111
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