Ex Parte RUSSO et al - Page 23

              Appeals 2006-2874 and 2006-2747                                                        
              Applications 08/544,212 and 09/287,664                                                 
              Patent 5,401,305                                                                       
          1         Here is what Appellants say about Gordon '252:                                   
          2                     In U.S. Pat. No. 4,206,252, Gordon                                   
          3               describes a process for depositing mixed oxide and                         
          4               nitride coating layers of continuously varying                             
          5               refractive index between a glass substrate and an                          
          6               infra-red-reflecting coating, whereby the film                             
          7               iridescence is eliminated.  When silicon dioxide is                        
          8               part of the mixed oxide film, the patent teaches                           
          9               that volatile silicon compounds with Si―Si and                             
         10               Si―H bonds are suitable precursors.  Compounds                             
         11               such as 1,1,2,2-tetramethyldisilane, 1,1,2-                                
         12               trimethyldisilane, and 1,2-dimethyldisilane are                            
         13               disclosed.  All of the compounds containing Si―Si                          
         14               and Si―H bonds to which reference is made are                              
         15               expensive, and none are commercially available.                            
         16                                                                                          
         17         Reference to Gordon '252 confirms that Appellants are correct, at least          
         18   in part.                                                                               
         19         Plainly described in Gordon '252 is the use of a mixture of silicon and          
         20   tin precursors to make the film.  See, e.g., Col. 6, line 64 through col. 7,           
         21   line 5.                                                                                
         22         While it is true that Gordon '252 describes the use of a mixture of a            
         23   mixed silicon oxide and silicon nitride (col. 6, line 12), Gordon '252 also            
         24   describes the use of other silicon and metal combinations, including                   
         25   (1) silicon and tin (col. 6, line 11), (2) silicon and titanium (col. 6, line 13),     
         26   and (3) silicon and indium (col. 6, line 14).                                          
         27                                                                                          
         28                                  Hochberg                                                
         29         Hochberg is a prior art document cited in Appellants' specification              
         30   (col. 3, lines 55-64).                                                                 
         31         Appellants say the following about Hochberg:                                     

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