Ex Parte Wang et al - Page 3

                  Appeal 2007-2510                                                                                         
                  Application 10/389,456                                                                                   
             1    B. Statement of the Case                                                                                 
             2           The dispositive issue on appeal is whether the Examiner's claim                                   
             3    interpretation is correct; more precisely, whether the term "in contact with,"                           
             4    in the words of the Examiner, "allows for an intervening layer."                                         
             5           Claim 36 and Figures 16 and 17 provide sufficient context to                                      
             6    understand the claimed invention and the critical issues in this appeal.                                 
             7    Claim 36 reads (indentation and citations to figures added):                                             
             8           A method of forming a liner [138] in a trench in a germanium                                      
             9           containing layer [114], the method comprising:                                                    
           10                   selectively etching the germanium containing layer [114]                                   
           11                   to form the trench;                                                                        
           12                   providing a semiconductor layer [126] in the trench and                                    
           13                   in contact with the germanium containing layer [114] in a                                  
           14                   low temperature process below approximately 600°C;                                         
           15                   [Fig. 16] and                                                                              
           16            forming an oxide liner [128] from the semiconductor layer, the                                    
           17            oxide liner in contact with the germanium containing                                              
           18            layer [114].  [Fig. 17]                                                                           










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