Appeal No. 1995-1539
Application No. 07/950,388
without isolation or purification.” See column 3, line 68 to
column 4, line 2.
The Kvakovszky reference, like the Nader reference,
discloses reacting 4-acetoxystyrene (protected phenol) with a
base in a solvent to form the salt of 4-hydroxystyrene
(deprotected phenol) and then subsequently or simultaneously
reacting the salt of 4-hydroxystyrene with di-tertiary-butyl-
dicarbonate (a dicarbonate) in situ (in the presence of both
the base and 4-acetoxystyrene). See abstract, together with
page 2, lines 41-49. According to Kvakovszky, it is important
to not isolate the 4-hydroxystyrene prior to reacting it with
di-tertiary-butyl-dicarbonate. See page 6, lines 16-17. The
organic phase containing 84% yield of 4-tertiary-
butoxycarbony-
loxystyrene (substituted 4-hydroxystyrene) is recovered. See
example 3 at page 7. Alternatively, 84% yield of 4-tertiary-
butoxycarbonyloxystyrene is recovered after distillation. See
example 4 at page 7. The recovered 4-tertiarybutoxycarbony-
loxystyrene is polymerized (chemically reacted) to form a
photoresist material. See page 2, lines 28-29.
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