Appeal No. 1995-1539
Application No. 07/950,388
Appellant argues that both Nader and Kvakovszky do not
teach one of ordinary skill in the art to avoid distilling 4-
tertiary-butoxycarbonyloxystyrene (a substituted 4-
hydroxystyrene) prior to a subsequent chemical reaction.
According to appellant, both Nader and Kvakovszky are directed
to forming a photoresist material which cannot tolerate the
presence of alkali metal impurities. Appellant then refers to
his own statement at page 4, lines 26-28, of the specification
which states:
Although bases within this range will promote
the
reaction, bases such as sodium hydroxide having
metal
moieties should typically be avoided for electronic
applications where contaminants such as sodium are
quite undesirable.
Appellant goes on to conclude that the need to remove alkali
metal impurities would have led one of ordinary skill in the
art to employ distillation prior to a subsequent chemical
reaction. We do not agree.
As indicated supra, we observe that the Nader reference
specifically teaches derivatizing (chemically reacting)
directly a substituted 4-hydroxystyrene in the organic phase
without isolation (distillation) or purification. Appellant’s
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