Appeal No. 95-2347 Page 3
Application No. 07/928,642
means for selectively moving the susceptor support means
vertically for positioning the susceptor and wafer parallel to
the gas manifold at a plurality of selected positions closely
adjacent the gas manifold, and further including
means for circulating fluid at a controlled temperature
within the gas inlet manifold so as to maintain the internal
surfaces of said gas manifold within a temperature range for
suppressing condensation, decomposition and reaction of gases
within said manifold and so as to maintain the external
surfaces of said gas manifold at a higher temperature than
said internal surfaces, said higher temperature sufficient to
prevent formation of particulates on said external surfaces.
The prior art references of record relied upon by the
examiner in rejecting the appealed claims are:
Davies et al. (Davies) 4,313,783 February 2,
1982
Chen et al. (Chen) 4,534,816 August 13,
1985
Shibata et al. (Shibata) 4,563,240 January
7, 1986
Shioya et al. (Shioya) 4,625,678 December 2,
1986
Kanai 60-202937 October 14,
1985
(Japan)
Page: Previous 1 2 3 4 5 6 7 8 9 10 11 12 13 14 Next
Last modified: November 3, 2007