Appeal No. 1997-2593
Application No. 08/160,290
1. A positive resist composition
comprising, in admixture, an alkali-soluble
novolak resin, an ester of a hydroxyl group
containing compound with a quinone diazide
sulfonic acid, and a mixed solvent consisting
essentially of:
(B) at least one organic solvent selected
from the group consisting of (-butyrolactone and
3-methoxybutanol; and
(A) an organic solvent other than solvent
(B) having a molecular structure which does not
have simultaneously an alkylcarbonyl group and
an alkoxy group therein and having a boiling
point of from 140 to 180E C under atmospheric
pressure, wherein a weight ratio of said organic
solvent (A) to said organic solvent (B) is from
95:5 to 40:60.
10. The positive resist composition
according to claim 1, wherein said solvent (B)
is (-butyrolactone.
The references of record relied upon by the examiner are:
Uetani et al. (Uetani) 5,059,507 Oct. 22,
1991
Liu 5,246,818 Sep. 21,
1993
Appealed claims 1, 7, 10, and 23 stand rejected under
35 U.S.C. § 102(e) as anticipated by or, in the alternative,
under 35 U.S.C. § 103 as unpatentable over Liu. All appealed
claims stand rejected under 35 U.S.C. § 103 as unpatentable
over Uetani in view of Liu.
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