Appeal No. 1997-2593
Application No. 08/160,290
substrates as positive working photosensitive coatings. See
the answer at page 6. Thus, prior to exposure and
development, Uetani’s positive photoresist composition is also
applied to a substrate, e.g. a silicon wafer, where the
solvent evaporates at a suitable drying rate to give a uniform
and smooth coating film. See Uetani at column 4, lines 7-17
and column 6, lines 4-7. Again, none of the comparative
examples reported in appellants’ experimental test results
(specification, page 18) involve the use of the specifically
exemplified solvent of Uetani, i.e., ethyl cellosolve acetate.
See Uetani at column 6, lines 6 and 7. Further, we point out
that Uetani’s compositions, like appellants’ compositions, are
said to provide excellent resolution. See Uetani at column 1,
lines 29-35. Thus, we agree with the examiner that the
subject matter defined by appealed claims 1 and 10 would have
been obvious within the meaning of
35 U.S.C. § 103 in view of the combined disclosures of Uetani
and Liu. Accordingly, we also sustain the examiner’s
rejection of the appealed claims for obviousness based on
Uetani and Liu.
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