Appeal No. 1997-2593
Application No. 08/160,290
We affirm.
The subject matter on appeal is directed to a positive
resist composition which comprises an alkali-soluble novolak
resin, a quinone diazide compound, and a solvent blend mixture
which "consists essentially of" certain organic solvents (A)
and (B), as defined in the appealed claims. For example,
organic solvent (A) may be diacetone alcohol and organic
solvent (B) may be (-butyrolactone. See appealed claims 1,
10, and 23. Further, for the herein claimed composition, the
weight ratio of organic solvent (A) to organic solvent (B) is
from 95:5 to 40:60.
The examiner’s prior art rejections of the appealed
claims are primarily based on disclosures in Liu. This prior
art patent is directed to, inter alia, photographic elements
comprising certain positive working photosensitive coatings
applied to substrates to form a "color proofing film". See
Liu at column 1, lines 6-24. Liu’s photosensitive coating
compositions are comprised of, inter alia, a quinone diazide
photosensitizer (preferably the ester of bis-(3 benzoyl-4,5,6
trihydroxyphenyl)-methane and 2-diazo-1-naphthol-5-sulfonic
acid); a binder resin (preferably aqueous alkaline soluble
3
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