Ex Parte KALTER et al - Page 5




          Appeal No. 2003-2137                                                        
          Application No. 09/236,183                                                  


          1697, 1701 (Fed. Cir. 1995).  Claim 4 on appeal requires that the           
          sacrificial metal layer is “in direct contact” with the integrated          
          circuit chip.                                                               
               Appellants argue that an important difference between claim 4          
          on appeal and the references is that the claim requires the                 
          sacrificial layer to be in direct contact with the integrated chip          
          while the sacrificial layer of the references does not touch or is          
          not in “direct contact” with the integrated chip (Brief, pages 6-           
          7).  The examiner finds that metal layer 120 of Beckenbaugh is a            
          sacrificial metal layer that is in “direct contact” with the                
          integrated circuit chip “via bonding pad (78)” (Answer, page 3).            
          Implicitly, the examiner construes the term “in direct contact” to          
          include intervening structures such as the bonding pad 78.  We              
          disagree.                                                                   
               As argued by appellants in reply to the examiner’s rejection           
          under paragraph one of section 112 (now withdrawn), basis for the           
          term “in direct contact” may be found in the specification at page          
          4, l. 32-page 5, l. 15, as well as Figures 6A-6C (Brief, pages 4-5;         
          see also Paper No. 6 and the Answer, page 3).  The specification            
          teaches that a sacrificial metal layer is deposited on the surface          
          of the insulator layer (page 2, ll. 21-22), thus necessarily                
          filling the opened vias and contacting or touching the integrated           

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