Ex Parte Maeda - Page 2




          Appeal No. 2003-1310                                                         
          Application No. 09/761,738                                                   

          expansion or reduction of the production scale.  Recent                      
          development of the semiconductor manufacturing techniques allows             
          integrating larger number of circuit elements into a single                  
          semiconductor chip, trailed by combining various circuit                     
          components, also known as “micro cell” or “Intellectual Property             
          (IP).”  Each IP is composed of a plurality of circuit elements               
          and performs a certain function (specification, page 2, line 22              
          through page 3, line 2).  A mask pattern of each IP is generated             
          and transferred to a predetermined position of the semiconductor             
          chip based on an overall layout information (specification,                  
          page 34).  As depicted in Figure 39, superposition marks 132 are             
          patterned around an IP mask pattern 131 on a mask 130, which are             
          used to properly position each of the IP patterns 131                        
          (specification, page 35).                                                    
               Representative independent claim 21 is reproduced as                    
          follows:                                                                     
                    21. A method of manufacturing a semiconductor device               
               for building a circuit composed of combined plural                      
               intellectual properties into a semiconductor chip,                      
               comprising:                                                             
                    arranging each mask pattern of said plural intellectual            
               properties for a layout pattern.                                        
               The Examiner relies on the following prior art reference:               
          Krolikowsky et al. (Krolikowsky)    3,760,384      Sep. 18, 1973             

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