Ex Parte SANDHU - Page 33




                the person of ordinary skill in the art that the inventive contribution was simply the use of a friction                    
                enhancing coating.                                                                                                          
                        Similarly, Leung’s “copied” claims are generic in that they do not require bombarding CVD                           
                films with high energy ions or subjecting films to a biased plasma.  Like Curtis’ parent application,                       
                the written description of the 143 Specification does not convey possession of a generic invention.                         
                The 143 Specification does not convey any other way to reduce resistivity other than treatment with                         
                a plasma and high energy ions.                                                                                              
                                                                     E.                                                                     
                        Leung asserts that the doctrine of inherency is applicable.  Paper 85, pp. 19-22.  In particular                    
                Leung argues:                                                                                                               



                                Since both Sandhu and Leung teach identical processes, the mechanism by                                     
                                which the carbon is removed from the respective films cannot be different.                                  
                                Thus, the doctrine of inherency should apply because the Leung teachings                                    
                                inevitably lead to the Sandhu subject matter.                                                               
                Paper 85, p. 20.                                                                                                            
                        We do not agree that the parties describe identical processes as argued by Leung.  Sandhu’s                         
                specification does not describe bombarding CVD films with high energy ions from a voltage biased                            
                plasma.    On  the  other  hand  the  143  Specification  repeatedly  emphasizes  the  importance  of                       
                bombardment by high energy ions  obtained from a voltage biased plasma.  The only description in                            
                the 143 Specification of a process which uses a plasma to post-treat CVD films but does not employ                          
                bombardment  with  high  energy  ions  are  the  comparative  examples  C5  and  C6.  Application                           
                09/128,143, Specification, p. 11, Table II.  These two examples report resistivities of 13,500 and                          
                15,500 :ohm-cm well above the order of 1000 :ohm-cm the 143 Specification says to be desirable                              
                for use as barrier layer films and above the value the 143 Specification says it is unacceptable for that                   
                purpose.  Application 09/128,143, Specification, p. 7, ll. 13-19.  The 143 Specification specifically                       
                acknowledges that “none of these pre- and post-treatments had much effect on the sheet resistivity.”                        
                Application 09/128,143, Specification, p. 11, ll. 19-20.  Additionally, the 143 Specification is totally                    
                silent as to the effect the C5 and C6 processes had on the carbon content.                                                  


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