Application 09/128,143, Specification, p. 8, ll. 6-8. The 143 Specification notes that when these ion
bombarded films are exposed to air, water vapor or oxygen
the oxygen is not absorbed, or is absorbed to a much lesser extent than when
no bias voltage has been applied.
Application 09/128,143, Specification, p. 8, ll. 10-11. Further, with respect to the ion bombarded
films, the 143 Specification notes that “the treated titanium films of the invention” are more
crystalline, contain more nitrogen and have reduced amounts of oxygen and carbon when compared
to conventional (untreated) films. Application 09/128,143, Specification, p. 8, ll. 11-16. The TiN
films “of the invention” are also stated to have a low, stable sheet resistivity. Application 09/128,143,
Specification, p. 8, ll. 16-17.
To demonstrate the advantages said to be achieved with the process “of the invention,” the 143
Specification also compares the results for films produced using a plasma and ion bombardment with
films made using other techniques which did not include a plasma or ion bombardment. Application
09/128,143, Specification, p. 9, l. 5 - p. 11, l. 24.
The 143 Specification describes CVD of TiN, said to have been done using prior art
parameters, resulted in an unacceptably high average resistivity of 11,360 :ohms-cm/sq which
significantly increased on exposure to air. Application 09/128,143, Specification, p. 9, l. 5 - p. 10, l. 2
and Fig. 2. Testing of these films was said to show an unacceptably high level of carbon and oxygen.
Application 09/128,143, Specification, p. 10, ll. 3-11 and Fig. 3. The 143 Specification also describes
modifying the TiN deposition technique in an effort to reduce the unacceptable resistivity.
Application 09/128,143, Specification, p. 10, ll. 12 - p. 11, l. 20. First, additional gases were added
during the TiN deposition step, apparently without any post treatment. Application 09/128,143,
Specification, p. 10, ll. 12 - p. 11, l. 20. The results are summarized in Table 1. Application
09/128,143, Specification, p. 10. The results were compared with control samples said to have been
prepared according to a prior art process. The prior art control samples were reported as having a
resistivities of 11,360 (Application 09/128,143, Specification, p. 9, ll. 21-22) and 16,000 (Application
09/128,143, Specification, p. 10, Table 1). Only Example C2, which added NF3, was said to decrease
resistivity compared to the control samples. Application 09/128,143, Specification, p. 10, Table 1,
Example C2. However, Example C2 was said to be unacceptable because of high fluorine content.
Application 09/128,143, Specification, p. 10, l. 28 - p. 11, l. 3. The other examples (C1, C3 and C4)
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