Ex Parte Abraham et al - Page 10




               Appeal No. 2006-2344                                                                                             
               Application No. 10/408,890                                                                                       

                              Wafer  table  system  14  may  be  a  wafer  table  system  of  an  Abacus  IIID-                 
                      SETTLEMENT AGREEMENT Die Bonder of Texas instruments Incorporated. Wafer table                            
                      system 14 includes wafer table 50, adhesive surface 52, and silicon wafer 54. Wafer table 50              
                      comprises a programmable controller that receives the wafer center coordinates from wafer                 
                      center computing system 38 and then calculates the continuous wafer edge coordinates from                 
                      the wafer center coordinates. Wafer table 50 also comprises suitable motive elements and is               
                      operable to move in an "X" direction and a "Y" direction, as shown in FIG. 1, in response to              
                      control signals received from wafer table interface system 28. Wafer table 50 moves relative              
                      to the fixed die removal position, such that the die removal position may be controllably                 
                      located at any coordinate location of wafer table 50. Adhesive surface 52 comprises an                    
                      adhesive material that is used to hold silicon wafer 54. As previously noted, silicon wafer 54            
                      moves relative to adhesive surface 52 during cutting operations.                                          
                      With the above discussion in mind, we find that the combination of APA, Akimoto and                       
               Subramanian teaches the claimed invention.  We find that APA teaches a measuring equipment                       
               having a wafer table equipped with a rotary drive.  APA also teaches a vacuum suction                            
               mechanism that aligns the interior of the wafer table is used to hold the wafer in place during                  
               rotation of the drive.  APA further teaches a notch detector to determine the position of the wafer              
               and its notch, as well as a notch aligner, which aligns the wafer by means of its notch in the                   
               wafer edge.  Additionally, APA teaches aligning the coordinates of the wafer and the                             
               measurement system with a notch detector and a notch aligner in order to carry out                               
               measurements at precise locations of the wafer.  Next, we find that Akimoto teaches a substrate                  
               unit (33) having a first and second cuplike wafer tables (34, 35), one laid on top of the other,                 
               each including a support base and a support means that allow the substrate unit to move up and                   
               down suitably to place the substrate on an empty table, thereby allowing the substrate to wait for               
               processing.  Column 3, lines 20-24.  Next, we find that Subramanian teaches an adhesive                          
               material (52) as a substitute for a suction device (44) to secure in place a wafer inside of a wafer             


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