Appeal 2006-3124
Application 10/251,179
35 U.S.C. § 103(a) over AAPA in view of Fukuyama and Tanaka. Claim 13
is rejected under 35 U.S.C. § 103(a) over AAPA in view of Fukuyama and
Tanaka, and further in view of Maeda.
The Examiner relies on AAPA for a disclosure of the invention as
claimed in independent claim 1 with the exception of an adjustment for ring
height. Figure 2 of the present application, shown below, illustrates a prior art
device.
The Examiner describes Figure 2 as illustrating a substrate support (i.e.,
electrostatic chuck 14’) and an upper ring (hot edge ring 42) having a portion
which extends under a substrate. Answer 5.
The Examiner relies on Koike and Fukuyama for disclosures of a plasma
process chamber where the height of a focus ring is controlled to have
uniformity of processing under diverse processing conditions. Answer 5
7
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