Ex parte BEASOM - Page 11




          Appeal No. 96-1584                                                          
          Application 08/066,697                                                      


          The examiner observes that Taylor, unlike Muramatsu who grounds             
          trench material 20, provides a common electrode 23 connecting               
          trench material 32 and island region 22.  According to the                  
          examiner,                                                                   
               It would have been obvious to a skilled artisan to combine             
               the teachings of Taylor as to how to apply voltages to the             
               isolation structure with the analogous structure of                    
               Muramatsu and Piotrowski in order to insure full isolation             
               of the semiconductor devices. (Answer, p. 4, last paragraph)           
          With respect to dependent claims 2 and 3, which in effect set               
          forth a range for the prescribed bias voltage, the examiner has             
          set forth no argument in support of the rejection.  As to                   
          dependent claim 7, electrode 23 of Taylor is provided to                    
          interconnect trench resistor 32 and island collector region 22 of           
          transistor Q , not to insure full isolation of semiconductor                
                      2                                                               
          devices.  There appears to be no motivation for combining                   
          Taylor's interconnect of circuit elements with Muramatsu and                
          Piotrowski.                                                                 
                                CLAIMS 20, 21, and 24                                 
               Independent claim 24 recites,                                          
               said prescribed bias voltage having a value such that, when            
               said material capable of distributing a voltage applied                
               thereto is biased at said prescribed bias voltage, said PN             
               junction has a breakdown voltage which is greater than the             
               breakdown voltage of said PN junction when said material               
               capable of distributing a voltage applied thereto is biased            
               at the same bias voltage applied to said second                        
               semiconductor region.                                                  
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