Appeal No. 2001-2568
Application No. 09/178,848
We note that appellants make issue in connection with
an amendment made after final and state that the amendment
add nothing to the claim, however, the examiner still saw
fit to add Liou as a reference and change the rejection from
a 102 to a 103 despite the fact that the claim had not been
changed in a material sense. We note that this is a
petitional matter and we need not comment on it.
At the bottom of page 4 of the Brief, appellants state
that there is nothing in Fogelson that teaches or even
remotely suggests a subsequent masking of the cavity
sidewalls with further etching then taking place with the
cavity sidewalls masked.
We find that Fogelson conducts a first etching step to
etch region 30 as shown in Figure 2a. This is described at
column 5 at lines 6 through 8. The creation of etched
region 30 allows for the creation of fine pitch lead tips 42
that can approach a smaller die pad area 72. See column 5,
lines 30 through 34. These fine pitch lead tips 42 are
illustrated in Figure 5b. Once the etched region 30 is
formed the fine pitch lead tips 42 and the thicker base
leads can be formed. As shown in Figures 5a and 5b the fine
pitch lead tips 42 and the thicker base leads 112 can be
made by utilizing tapered fine pitch stamped tool punches
180. See column 5, lines 55 through 59. Alternatively a
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