Ex Parte Tang et al - Page 17


         Appeal No. 2004-0633                                                       
         Application No. 10/011,198                                                 





              35. The system in claim 34, wherein said second                       
         interconnect laterally contacts said first insulator.                      

              36. The system in claim 35, wherein said second insulator             
         laterally contacts said plug, and wherein said second insulator            
         is over a part of said second interconnect.                                
              37. A portion of a memory array, comprising at least one              
         integrated structure comprising a first interconnect within said           
         memory array and an electrical connector extending upward from             
         said interconnect.                                                         

              38. A portion of a memory device comprising:                          
              at least two portions of insulation defining:                         
              a first opening within said memory device, defining:                  
              a first plug site, and                                                
              a first interconnect site in communication with said first            
         plug site,                                                                 
              wherein said first plug site and said first interconnect              
         site are filled with a continuous amount of conductive material;           
         and                                                                        
              a second opening lateral to said first opening, said second           
         opening defining:                                                          
              a second plug site filled with at least one portion of said           
         at least two portions of insulation, and                                   
              a second interconnect site in communication with said                 
         second plug site, wherein said second interconnect site is                 
         filled with said conductive material.                                      
                                                                                   
              39. A level of interconnects for a memory device,                     
         comprising:                                                                
              a layer of insulation defining a plurality of trenches                
         within said memory device, wherein each trench of said plurality           
         defines a lower portion and an upper portion, and wherein:                 
              said lower portion is filled with metal,                              
              said metal extends up into at least one area of said upper            
         portion, and                                                               
              said upper portion is filled with oxide except in said at             
         least one area.                                                            

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