Appeal 2007-1269
Application 10/636,468
col. 6, ll. 1-2.) "The metrology data analysis unit 460 is capable of
correlating particular metrology data to corresponding semiconductor
wafers 105." (Pasadyn col. 6, ll. 2-4.) In addition:
The real-time, or near real-time, metrology data
stored in the metrology data storage unit 330
provides the system 300 access to immediate
manufacturing data that can be used to further
correct or enhance the accuracy of one or more
processes performed on the semiconductor wafers
105. Pre-process and post-process data stored in
the integrated metrology data storage unit 330 may
be used by the system 300 to perform comparisons
between the pre-process and post-process data to
evaluate the accuracy of the processes performed
on semiconductor wafers 105. Based upon the
evaluation, modifications to subsequent processing
of semiconductor wafers 105 may be performed by
the system 300.
(Pasadyn col. 6, ll. 7-19.)
4. As taught by Pasadyn, a computer can "access the metrology data and
perform analysis (e.g., comparison of the pre-process and post-process
metrology data to evaluate the accuracy of the process operations
performed on the semiconductor wafer 105) of processes performed
by the processing tools 410 (block 690)." (Pasadyn col. 9, ll. 40-45.)
"Results from the analysis of the metrology data may be used to
modify one or more control input parameters that control the
operations of the processing tools 410, such as feedback and/or feed-
forward adjustments (block 695)." (Pasadyn, col. 9, ll. 46-49.)
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