Appeal No. 1998-1069
Application No. 08/259,575
In regard to Ichikawa, Appellant notes that this 11
reference does not show a step of performing a first LDD
implant simultaneously in both n-well and p-well regions, and
the LDD implants are performed at lower energies than required
to realize the benefits of the claimed invention.
In review of the disclosure of Yamane, Appellant asserts12
that the structures formed by the process of Yamane do not
have LDDs, and the regions of opposite conductivity type
define a structure that is not relevant to the claimed
invention. Thus, Appellant posits that this reference does
not show a process for creating source and drain regions
having LDD tip regions extending from main source and drain
regions, and it fails to suggest any implant conditions for
comparison against the claims.
As an example of an alternative process gleaned from the
references, Appellant provides one in which no p-well is13
implanted (as in Bergonzoni, Hsu, and Schwabe), no LDD implant
11Brief, page 12, section 4.4
12Brief, page 12, section 4.5
13Brief, page 13, section 5
9
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