Interference No. 105,113
Preliminary Motion 2 is therefore granted with respect to claim 74 and its dependent claim 75.
Claim 76 specifies that the system recited in claim 73 further comprises "a system
controller adapted to control operations of one or more components of the electro-chemical
deposition system." Ritzdorf's "Amendment Under 37 C.F.R. § 1.607" in the '613 application
asserts that this limitation reads on the control system 580 in Figure 15, reproduced below, which
shows a temperature-gradient-type annealing apparatus employing a laser as the heating source:
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