1, 7, and 8 which were post-treated in a biased plasma. Application 09/128,143, Specification,
p. 13, l. 2 - p. 14, l. 15.
F 107. The Auger analysis of the bias-treated examples is said to show the “change in elemental
composition of the films after treatment in accordance with the invention.” Application
09/128,143, Specification, p. 13, ll. 13-15 (emphasis added).
F 108. The Auger analysis was said to show the presence of both oxygen and carbon but that the
oxygen content was markedly reduced. Application 09/128,143, Specification, p. 14, l. 3 -
p. 14, l. 10.
F 109. However, the Auger analysis is also said to show that carbon content of voltage bias-treated
films did not change:
Carbon is the only other major impurity, and remains unaffected by the
present process.
Application 09/128,143, Specification, p. 14, ll. 10-12.
Original Claims
F 110. As filed, the 143 Application included 12 claims. Application 09/128,143, Specification, pp.
18-19.
F 111. Claims 1, 2 and 9 were the only independent claims. Application 09/128,143, Specification,
pp. 18-19.
F 112. Each of the original claims required either bombarding the film with high energy ions or
exposing a film to a plasma while applying a bias voltage. Application 09/128,143,
Specification, pp. 18-19.
F 113. Leung Claim 1 was directed to the method of improving the properties of the film deposited
on a substrate by “bombarding the films with energetic ions.” Application 09/128,143,
Specification, p. 18, ll. 1-3.
F 114. Leung Claim 2 required “exposing the film to a plasma of a precursor gas while applying a
bias voltage to said substrate.” Application 09/128,143, Specification, p. 18, ll. 5-9.
F 115. Leung Claim 9 was specific to TiN films and required “treating the film by applying a bias
voltage to the substrate in the presence of a plasma of a precursor gas.” Application
09/128,143, Specification, p. 19, ll. 11-15.
The “Copied Claims”
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Last modified: November 3, 2007