Ex Parte NAKAMURA et al - Page 1



               The opinion in support of the decision being entered today was not     
               written for publication and is not binding precedent of the Board.     
                                                               Paper No. 21           
                      UNITED STATES PATENT AND TRADEMARK OFFICE                       
                                    ____________                                      
                         BEFORE THE BOARD OF PATENT APPEALS                           
                                  AND INTERFERENCES                                   
                                    ____________                                      
                    Ex parte AKIHIRO NAKAMURA and YUTAKA HAYASHI                      
                                    ____________                                      
                                Appeal No. 2000-0660                                  
                             Application No. 08/985,278                               
                                    ____________                                      
                                      ON BRIEF                                        
                                    ____________                                      
          Before FLEMING, RUGGIERO, and LALL, Administrative Patent Judges.           
          FLEMING, Administrative Patent Judge.                                       


                                 Decision on Appeal                                   
               This is a decision on appeal from the final rejection of               
          claims 1 through 3 and 5 through 11.  Claim 4 has been cancelled.           
               The invention relates to a nonvolatile one-transistor memory           
          cell.  The transistor memory cell includes a channel forming                
          region (11a), a tunnel film (12) formed over the channel forming            
          region (11a), a nitride film (13a) formed over the tunnel film              
          (12), a top oxide (13b) formed over the nitride film (13a) and a            
          gate electrode (14) formed over the top oxide film (13b).  See              
          Appellants' specification page 4, line 20 to page 5, line 3, page           
          10, lines 7-22 and Figure 1.  The tunnel film (12) is formed to             




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