Ex Parte KODAMA - Page 3




          Appeal No. 2001-2659                                                        
          Application 08/919,674                                                      


                                    THE REFERENCE                                     
          Kume et al. (Kume)            5,188,976            Feb. 23, 1993            
                                    THE REJECTION                                     
               Claims 1-13 stand rejected under 35 U.S.C. § 102(b) as being           
          anticipated by Kume.                                                        
                                       OPINION                                        
               We reverse the aforementioned rejection and remand the                 
          application to the examiner.  We need to address only the                   
          independent claims, i.e., claims 1, 2, 10 and 12.                           
                                   Claims 1 and 2                                     
               “Anticipation requires that every limitation of the claim in           
          issue be disclosed, either expressly or under principles of                 
          inherency, in a single prior art reference.”  Corning Glass Works           
          v. Sumitomo Electric, 868 F.2d 1251, 1255-56, 9 USPQ2d 1962, 1965           
          (Fed. Cir. 1989).                                                           
               Both of claims 1 and 2 require the step of “forming a first            
          polysilicon layer over the entire surface of said semiconductor             
          base, and then patterning said first polysilicon layer in a                 
          manner such that said first polysilicon layer is left covering              
          only said first gate insulating layer of said first region”.                
          Claims 1 and 2 do not require that the steps are carried out in             
          the recited order.  However, the forming and patterning in the              
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