Appeal 2007-0908 Application 10/152,077 A. Introduction Appellants ("Christenson") appeal under 35 U.S.C. § 134 from the final rejection of claims 1-5, 8-11, and 45-57, which are all of the pending claims, as unpatentable under 35 U.S.C. § 103(a) in view of various references. We have jurisdiction under 35 U.S.C. § 6(b). We REVERSE- IN-PART, AFFIRM-IN-PART and enter NEW GROUNDS OF REJECTION. The Claimed Subject Matter The subject matter on appeal relates to a process of rinsing and drying substrates in the microelectronics industry. Claim 1 is illustrative and reads as follows: A method of processing a microelectronic device as rotatably supported within a processing chamber, the method including the steps of: [1] creating an atmosphere comprising gas within the processing chamber and about a surface of the microelectronic device supported within the processing chamber; [2] rinsing the microelectronic device by [2a] spraying a rinsing fluid onto a surface of the device within the gas atmosphere while also [2b] supplying a surface tension reducing agent into the gas atmosphere within the processing chamber; and [3] drying the device by [3a] rotating the device at a predetermined drying rotational speed for an effective time period to dry the device and, 2Page: Previous 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 Next
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