Appeal 2007-0908
Application 10/152,077
The Rejections
The Examiner has maintained the following rejections:
(a) Claims 1-5, 8, 11, and 45 have been rejected under 35 U.S.C.
§ 103(a) over the combined teachings of Ueno2 and Yoneda3. This was a
new ground of rejection as authorized by 37 C.F.R. § 41.29(a)(2).
(b) Claims 9 and 10 have been rejected under 35 U.S.C. § 103(a)
over the combined teachings of Ueno, Yoneda, and Mohindra4. This was a
new ground of rejection as authorized by 37 C.F.R. § 41.29(a)(2).
(c) Claim 46 has been rejected under 35 U.S.C. § 103(a) over the
combined teachings of Ueno, Yoneda, and Hamaya5.
(d) Claim 47 has been rejected under 35 U.S.C. § 103(a) over the
combined teachings of Ueno, Yoneda, and Bergman6.
2 Kinya Ueno, Spin Cleaning Method, U.S. Patent 5,882,433, 16 March
1999.
3 Kenji Yoneda, Equipment for Cleaning, Etching and Drying
Semiconductor Wafer and its Using Method, U.S. Patent 5,896,875, 27 April
1999.
4 Raj Mohindra et al., Method for Cleaning and Drying a Semiconductor
Wafer, U.S. Patent 5,571,337, 5 November 1996.
5 Sumio Hamaya, Spin Dryer for a 256 M DRAM Semiconductor, JP
H10-256,221, 25 September 1998. (PTO translation.)
6 Eric J. Bergman, Vapor Assisted Rotary Drying Method and Apparatus,
U.S. Patent 6,199,298 B1, 13 March 2001, based on application 09/413,622,
filed 6 October 1999.
4
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